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Electrical semiconductor characterization
Luminescence dating, research, dosimetry and more
Contamination monitor, beta-aerosol monitor, dose rate meter and more
for ultra-fast crystal orientation, crystal alignment in production, quality control, rocking curve measurements, material...
state-of-the-art XRD system for automatic single crystal ingot orientation, tilting and alignment for grinding
Wafer sorting, crystal orientation, resistivity, optical notch and flat determination
Flexible diffractometer for ultra-fast Omega Scan orientation determination
Smart diffractometer for ultra-fast Omega-scan of small samples.
Robust XRD equipment for fully automated in-line testing & alignment
for blanks, wafers & bars (AT, SC, TF, etc.)
three generations of X-ray engineers
in industrial production, R&D and more
discover the most convenient way of measuring orientation of single crystals
Mono- and Multi-crystalline wafer lifetime measurement device
Low cost table top lifetime measurement system for characterization of a variety of different silicon samples at different...
Mono- and Multi-crystalline wafer and brick lifetime measurement device
for production and quality control of monocrystalline Si ingots,bricks and wafers
Flexible OEM unit for lifetime measurements at a variety of different samples ranging from mono- to multicrystalline silicon...
for contactless and temperature dependent lifetime and LBIC measurements
High Resolution Resistivity Mapping Tool for process control and quality assurance measurements
The minority carrier life time is sensitive for all kinds of electrically active defects in semiconductors and is therefore...
MDP is an advanced technology with a so far unsurpassed combination of sensitivity, speed and resolution for fab and lab...
High sensitivity, high resolution surface photovoltage (SPV) measurement instrument
High sensitivity, high resolution surface photovoltage spectroscopy (SPS) instrument with a variable energy excitation source...
for quality control of bifacial PERC/PERC+ solar cells and more
portable in field PID tester for solar modules
user friendly and advanced operating software
The PIDcon devices are designed to investigate the PID susceptibility for production monitoring of solar cells as well as tests...
Learn more about the reasons for PID and the how the susceptibility of solar cells, mini modules and encapsulation materials can...
Our quality management system is an integrated process-oriented system with ISO 9001 certification.
February 10, 2023
An analysis of the state of a semiconductor – from start wafer until final device – is considered a job for specialists and there are very few analysis tools that can be used as a “decision maker” for good and/or bad material quality directly in the production.
The new Freiberg Instruments high-resolution surface photovoltage spectroscopy (HR-SPS) tool is a true production tool in the sense that it does its job without influencing the workflow speed. The HR-SPS checks critical-to-yield parameters in the material used in the production – be it silicon, silicon carbide or other semiconductors or photoactive materials.
The HR-SPS tool measures the time-resolved surface photovoltage response of the material when excited by one or more light sources. The light source(s) are chosen according to the material electronic properties and to known imperfections in the material that can be associated with yield loss. As an example, in silicon monocrystalline wafers, there can be a number of imperfections that can lead to yield losses during device processing. Silicon monocrystalline wafers can have high concentrations of nitrogen originating from the boule growth cycle or from the different device processing steps. The nitrogen atoms can form a substitutional pair in the otherwise perfect silicon crystal and this pair can heavily impact the performance of MOS gate structures, because the pair form unfortunate electronic states in the silicon wafer. The HR-SPS tool can not only measure the presence of such defects, but also their approximate density. In this way, variations within wafer batches and between wafer batches can be monitored and reported over the equipment/tool-to-host interface protocol and used for SPC purposes.
The HR-SPS is a very versatile tool that can be configured in a number of ways. It can be used for almost any photoactive material – the only limitation currently is the bandgap energy, which is limited to 5.0 eV. The basic measurement is a nanosecond time-resolved surface photovoltage signal with an excellent signal-to-noise ratio and 5-6 orders magnitude scale. One measurement takes approximately 15–30 seconds, including the signal analysis loop. The output can be anything from a good/no-good criterion to a full measurement report on the state of the tested material(s). Needless to say, but any mechanical adaption to automated material handling systems (AMHS) compliant to SEMI standards can of course be made.
Application example 1: Defects in 4H-SiC investigated by surface photovoltage spectroscopy – power semiconductors
Application example 2: Defects and charge dynamics in 3C- and 4H-SiC investigated by surface photovoltage spectroscopy – photoelectrochemical/photocatalytic water splitting
For more information, contact us.
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