Fast and reliable resistivity mapping tool for highly doped samples
Exceptional Repeatability (sigma < 0.15%)
Advanced Stability Sensors
Seamless Inline Integration and Effortless Calibration
Materials
The RESmap is specialized on highly doped materials
Features & Benefits
< 0.15 %
repeatability
Resistivity
1–150
mOhm cm
throughput
> 20
Wafer per hours
± 5 %
accuracy
Bull´s eye chart management for maximum accuracy and precision
Measurement principle of eddy current sensor
Applications
4H-SiC wafer resistivity variation measurement across the growth facet area
Si wafer resistivity variation measurement – mapping, distribution & line scans
| Prepared for Automation | different platforms available |
|---|---|
| Measurement method conforms | with SEMI MF673 |
| Data and data validity checked | using NIST standards |
| Accuracy over calibration | interval ±1% |
| Integrated IR temperature sensor (±0.1°) | to allow reporting resistivity at a standard temperature, different from the actual temperature of the sample |
| Sample thickness correction | for samples where the penetration depth of the high frequency signal is larger than the penetration depth |
| Power requirements | 100-250 VAC, 5 A |
| Dimensions (w/h/d) | 465 x 550 x 600 mm |
| Software control | standard PC with Window 10 or latest, 2 Ethernet ports |
User-friendly and advanced operating software with
Resistivity measurement recipes
Export/import functions and raw data access
Multi-level user account management
Overview over all performed measurements
Mapping options (line, cross, star, full map, topography, user defined pattern)
Package of analysis functions; statistics, variance analysis, temperature correction functions and library
Remote accessibility; Internet based based system allows remote operation and technical support from anywhere in the world